Si3N4/CrN nanostructured muitilayers grown by RF reactive magnetron sputtering |
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引用本文: | 姜世杭,许俊华,李戈扬.Si3N4/CrN nanostructured muitilayers grown by RF reactive magnetron sputtering[J].中国有色金属学会会刊,2004,14(4):692-696. |
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作者姓名: | 姜世杭 许俊华 李戈扬 |
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作者单位: | [1]DepartmentofMechanicalEngineering,YangzhouUniversity,Yangzhou225009,China [2]StateKeyLabofMetalMatrixComposites,ShanghaiJiaotongUniversity,Shanghai200030,China |
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摘 要: | The amorphous/polycrystalline Si3N4/CrN nancrstructured multilayer films have been prepared by radio frequency (RF) reactive magnetron sputtering. The composition, microstructure and mechanical properties of these films were characterized by X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), high-resolution transmission electron microscopy (HRTEM) and nano-indentation. The CrN and Si3N4 single layer films are polycrystalline face centered-cubic and amorphous structures, respectively. The CrN and Si3N4 layers are nearly stoichiometric. The HRTEM image indicates that the interfaces are planar and modulation structure is clear in multilayers. The hardness values of Si3N4/CrN multilayers are between those of the constituent CrN and Si3N4 films at a substrate temperature of 20℃, and are somewhat higher than those of Si3N4 films at a deposition temperature of 500℃. There is no superhardness effect in the Si3N4/CrN multilayers. Based on the experimental results, the hardening mechanisms in the multilayers have been discussed.
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关 键 词: | 磁控溅射 Si3N4/CrN 纳米材料 XPS XRD 物理气相沉积 显微结构 机械性能 |
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