Microstructural transitions and dielectric properties of boron-doped amorphous alumina thin film

Dielectric Al_2?x B _x O_Y thin films were deposited onto Pt (100)/Ti/SiO₂/Si substrates via sol–gel and spin-coating technology. The microstructural transition occurred at ~500 °C due to boron loading was confirmed by DSC and XRD. FTIR, ²⁷Al MAS NMR and XPS measurements were employed to investigate the microstructural transition caused by different boron concentrations. The results revealed that Al–O–B bonds and [AlO₄] tetrahedrons were produced resulting in the reinforcement of structure with relatively low boron concentrations. With the increase of boron concentration, [BO₃] chains and new surfaces crossing over the internal structure gradually produced and disrupted the structural stability. Meanwhile, hydroxyl groups were accumulated in the internal structure owing to the hydrophilic property of boron. According to the reinforced structure with low boron concentrations, the current density decreased and the breakdown strength was enhanced. Typically, the current density was decreased two orders of magnitude at 100 MV m^?1 and the breakdown strength of the 0.5 mol% B-doped alumina thin film was increased by 59% (from 293 to 465 MV m^?1) in comparison with that of the undoped alumina thin film, whereas the dielectric properties gradually become poor due to the weak structure with the increase of boron concentration. Moreover, the dielectric constant increased owing to hydroxyl groups when the boron doping increased. This work may provide a general strategy for enhancing dielectric properties of the alumina thin film.