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基体偏压模式对CrN薄膜结构和阻氢性能的影响
引用本文:张辉,王晓波,张炜鑫,巩春志,田修波.基体偏压模式对CrN薄膜结构和阻氢性能的影响[J].真空,2022(1):18-23.
作者姓名:张辉  王晓波  张炜鑫  巩春志  田修波
作者单位:哈尔滨工业大学先进焊接与连接国家重点实验室;中国工程物理研究院材料研究所
基金项目:国家自然科学基金(11875119和12075071);黑龙江省自然科学基金联合引导项目(编号LH2019A014)。
摘    要:为了避免金属材料因为氢扩散而导致的失效,通常在其表面制备氧化物或氮化物等的阻氢薄膜,而薄膜的微观组织、晶体结构等对其阻氢性能的影响显著.本文在不锈钢基体上制备出CrN阻氢薄膜,系统研究了高/低基体偏压调制模式对CrN薄膜结构和阻氢等性能的影响.采用高功率磁控溅射技术在四组基体偏压模式下分别制备了具备一定高温抗氧化性的C...

关 键 词:基体偏压模式  CrN  高功率脉冲磁控溅射  阻氢  高温抗氧化

Effect of Substrate Bias Mode on Structure and Hydrogen Resistance of CrN Thin Films
ZHANG Hui,Wang Xiao-bo,ZHANG Wei-xin,GONG Chun-zhi,TIAN Xiu-bo.Effect of Substrate Bias Mode on Structure and Hydrogen Resistance of CrN Thin Films[J].Vacuum,2022(1):18-23.
Authors:ZHANG Hui  Wang Xiao-bo  ZHANG Wei-xin  GONG Chun-zhi  TIAN Xiu-bo
Affiliation:(State Key Laboratory of Advanced Welding and Joining,Harbin Institute of Technology,Harbin 150001,China;Institute of Materials,China Academy of Engineering Physics,Mianyang 621908,China)
Abstract:In order to avoid the failure of metal materials due to hydrogen diffusion,oxide or nitride films are usually prepared on the surface of metal materials.The microstructure and crystal structure of the films have significant influence on the hydrogen resistance.In this paper,CrN hydrogen barrier films were prepared on stainless steel.The effects of high/low substrate bias modulation mode on the structure and hydrogen resistance of Cr N films were studied systematically.CrN thin films with high temperature oxidation resistance were prepared by high power pulsed magnetron sputtering under four groups of substrate bias modes.The results show that under 20 min×3 mode,the films are double-layer structure,and the others are single-layer films.When the substrate bias is 100 V and 500 V,the impact effect on the film is very different by ion.Under 10 min×6 mode,the columnar crystal is broken before it grows because of frequent matrix bias change,so the film is the thinnest,but the grain is refined and the density of the film is the highest.Under 20 min×3 mode,the hydrogen inhibition rate of the film was the highest,reaching 95.7%,the diffusion coefficient of hydrogen atom is the smallest,which is 3 orders of magnitude lower than that of316 L stainless steel.The oxidation resistance of CrN films is not much different under the four kinds of substrate bias modes,and the oxygen gain per unit area is about half of that of the 316 L stainless steel.The oxidation resistance of CrN films prepared by this experiments is twice that of the 316 L stainless steel,and they have excellent high temperature oxidation resistance.
Keywords:substrate bias mode  CrN  high power pulsed magnetron sputtering  hydrogen blocking  high temperature oxidation resistance
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