氨络合物体系中镍阴极电沉积的电化学行为

通过极化曲线测量，对氨络合物体系中镍阴极电沉积电化学行为进行研究，系统探讨了溶液中总镍离子浓度、氨水浓度、氯化铵浓度、阴离子及温度等工艺条件对镍阴极还原的影响。研究结果表明：镍放电电流随着总镍离子浓度的上升而上升，随氨水浓度的升高而降低；在1—4mol／L氯化铵浓度范围内，镍放电电流随其浓度的降低而升高，而当氯化铵浓度低于1mol／L时，镍放电电流出现下降的现象；氯盐氨络合物体系中镍阴极放电电流明显高于硫酸盐氨络合物体系镍放电电流，镍放电电流随温度的升高而升高。根据实验现象，进一步分析了镍阴极电沉积电化学行为变化的原因。

Electrochemical behavior of nickel electrodeposition in ammonia complex bath

The electrochemical behavior of cathodic electrodeposition of nickel from ammonia complex bath was investigated by measuring polarization curves. The effects of total nickel, ammonia, ammonium chloride concentrations in the electrolyte as well as its anion species and temperature were studied systematically. The experimental results show that nickel discharge current increases with an increase in the total nickel ion concentration, and decreases with an increase in ammonia concentration respectively. The nickel discharge current increases with a decrease in ammonium chloride concentration within its range from 1 mol/L to 4 mol/L. However, nickel discharge current decreases as the ammonium chloride concentration is less than 1 mol/L. The nickel discharge current from leaching solution containing ammonia and chloride is significantly more than that from leaching solution containing ammonia and sulfate. The nickel discharge current increases with an increase in temperature. According to the phenomena of nickel discharge current, the results were analyzed rationally.