一种新型的掩膜管理控制系统的研制

研制了一种与掩膜光刻机相配套的新型掩膜管理控制系统.系统硬件由1个4自由度机械手、2个版库、粗预对准机构、精细预对准机构、PLC控制器和伺服驱动器等构成;系统软件由基于VC的上层管理程序以及基于梯形图的底层流程控制程序构成,其中上掩膜版和卸掩膜版是流程控制的主要组成部分.介绍了四象限光电探测器的对准工作原理和掩膜版的粗、精细预对准方法,实验测试了上、卸掩膜版的节拍,粗、精细预对准时间和掩膜版经过精细预对准后的重复定位精度,讨论了激光器和四象限光电探测器相对 位姿的标定方法,并指出了该系统的特点.实验结果表明,该系统性能稳定,主要指标能够满足掩膜光刻机的实际生产要求.

The development of a new control system for mask management

The paper introduces a new control system aiding the mask lithography for mask management.The hardware of the system consists of a manipulator with 4 degrees of freedom(DOFs),two mask storing boxes,a coarse aligning machine,a fine aligning machine,a PLC controller,servo drivers,etc.The software of the system contains two parts.The first part is the master program built by Visual(C++) for the whole system's management,and the second is the slave flow control program designed in ladder logic diagram(LLD) environment mainly for the purpose of mask loading and unloading.The working principle of four-quadrant-photodetector(FQPD) in alignment and the mask's coarse and fine pre-alignment algorithms are described.Experiments test the cycles of mask loading and unloading,the time cost in coarse and fine alignments and the repeatable positioning precision of the mask after fine pre-alignment.Experimental results demonstrated that the system developed in this paper works with great stability,and its main characteristics can meet the requirements from photolithography.The paper concludes with a discussion about the pose calibration of laser with respect to FQPD and a summary of the system's characteristics.