| 甲酸盐型三价铬电镀溶液稳定性研究 |
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| 引用本文： | 王先友 文清良. 甲酸盐型三价铬电镀溶液稳定性研究[J]. 电镀与涂饰, 1995, 14(2): 1-6 |
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| 作者姓名： | 王先友 文清良 |
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| 作者单位： | 中南工业大学冶金物理化学与新材料研究所，湘潭精细化工应用研究所 |
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| 摘 要： | 研究了Ｃｒ＾３＾＋在水溶液中的化学性质，从理论上计算不同ｐＨ值下，形成Ｃｒ（ＯＨ）沉淀的Ｃｒ＾３＾＋浓度及ＨＣＯＯ＾－在镀液中的粒子分布。镀液中的沉淀不只是Ｃｒ（ＯＨ３）而是含Ｃｒ＾３＾＋的混合物，镀液中的ＨＣＯＯ＾－对沉淀的形成加速作用，提出加入适当的辅助添加剂以提高镀液稳定性。
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| 关 键 词： | 镀铬 稳定性 镀液 电镀 甲酸盐型 |
Study on Stability of Trivalent Chromium Plating Solution Containing Formate |
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| WANG Xianyou,JIANG Hanying,WEN Qingliang. Study on Stability of Trivalent Chromium Plating Solution Containing Formate[J]. Electroplating & Finishing, 1995, 14(2): 1-6 |
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| Authors: | WANG Xianyou JIANG Hanying WEN Qingliang |
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| Affiliation: | WANG Xianyou;JIANG Hanying;WEN Qingliang |
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| Abstract: | Chemical properties of trivalent chromium ion in aqueous solution are studied. Various concentration of Cr3+ at which Cr (OH) 3 is precipitated and concentration distribution of HCOO- in the plating solution are calculated theoretically by variation in PH values of the solution. The sediment is a mixture including not only Cr(HO)3 but also compound of Cr 3+. HCOO- in the plating solution accelerates the formation of sediment. Suitable auxiliary additive is suggested to increase the stability of trivalent chromium plating solution. |
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| Keywords: | chromium electroplating trivalent chromium bath stability |
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