InAIGaAs selective MOVPE growth with bandgap energy shift |
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Authors: | T. Takeuchi M. Tsuji K. Makita K. Taguchi |
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Affiliation: | (1) Opto-electronics Research Laboratories NEC Corporation, 34 Miyukigaoka, Tsukuba-shi, Ibaraki, Japan |
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Abstract: | We studied the bandgap energy shift by varying the SiO2 mask width in selective MOVPE growth of InAIGaAs with almost no polycrystals on the masks. We found that the photoluminescence (PL) peak shifts toward the longer wavelength with wider mask width and narrower mesa width, where the In content is enhanced, and observed a maximum PL peak wavelength shift of 170 nm. |
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Keywords: | Bandgap controlling InAIGaAs metalorganic vapor phase epitaxy (MOVPE) selective growth |
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