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深亚微米CMOS集成电路抗热载流子效应设计
引用本文:陈曦,庄奕琪,杜磊,胡净.深亚微米CMOS集成电路抗热载流子效应设计[J].微电子学,2003,33(6):509-512.
作者姓名:陈曦  庄奕琪  杜磊  胡净
作者单位:西安电子科技大学,微电子所,陕西,西安,710071
摘    要:热载流子效应(HCE)、电介质击穿、静电放电,以及电迁移等失效机理,已经对VLSI电路的长期可靠性造成了极大的威胁。其中,热载流子效应是最主要的失效机理之一。影响CMOS电路热载流子效应的因素有:晶体管的几何尺寸、开关频率、负载电容、输入速率以及晶体管在电路中的位置。通过对这些因素的研完,提出了CMOS电路热载流子可靠性设计的通用准则。

关 键 词:深亚微米  CMOS集成电路  热载流子效应  可靠性设计
文章编号:1004-3365(2003)06-0509-04
修稿时间:2002年10月8日

Considerations on Hot-Carrier Effects in the Design of Deep Submicron CMOS IC's
CHEN Xi,ZHUANG Yi-qi,DU Lei,HU Jing.Considerations on Hot-Carrier Effects in the Design of Deep Submicron CMOS IC''''s[J].Microelectronics,2003,33(6):509-512.
Authors:CHEN Xi  ZHUANG Yi-qi  DU Lei  HU Jing
Abstract:Failure mechanisms, such as hot-carrier effect (HCE), dielectric breakdown, electro-static discharge (ESD) and electromigration, pose serious threat to the long-term reliability of VLSI circuits. And HCE is one of the most common failure mechanisms. Factors leading to hot-carrier effects in CMOS IC's include transistor size, switching frequency, load capacitance, input rate and the location of transistors in the IC. These factors are investigated and a number of general rules for design are presented based on the investigation, to ensure hot-carrier reliability.
Keywords:Hot-carrier effect  Design for reliability  Deep submicron device  CMOS IC
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