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PECVD淀积工艺及室温NO_x气体传感器
引用本文:廖清华,江风益,戴国瑞. PECVD淀积工艺及室温NO_x气体传感器[J]. 南昌大学学报(工科版), 1992, 0(3)
作者姓名:廖清华  江风益  戴国瑞
作者单位:江西工业大学(廖清华,江风益),吉林大学(戴国瑞)
摘    要:本文介绍了用PECVD技术淀积NO_x敏感的工艺,并对典型工艺参数条件进行了讨论。我们淀积的这种NO_x敏感膜,不仅在旁热情况下对NO_x敏感,而且在室温条件下也能对NO_x气体敏感。最后,我们对室温NO_x气体传感器的一些重要性能指标进行了研究。

关 键 词:PECVD  薄膜  传感器

PECVD Technique and Room-temperature NO_x Gas Sensor
Liao Qinghua Jiang Fengyi. PECVD Technique and Room-temperature NO_x Gas Sensor[J]. Journal of Nanchang University(Engineering & Technology Edition), 1992, 0(3)
Authors:Liao Qinghua Jiang Fengyi
Affiliation:Liao Qinghua Jiang Fengyi (Jiangxi Polytechnic University)Dai Guorui (Jilin University)
Abstract:The NO_xsensitive thin-film grown by PECVD technique is introduced in this paper, The correlations between the properties of the thin films and their tipical deposition conditions have been investigated. The thin-film is not only sensitive to NO_xgases during heating, but also sensitive to NO_xgases in room-temperature. Finally, we determinated the eharaeteristes of the time reponse and restoring for NO_xgas sensors in room temperature.
Keywords:PECVD   Thin-film   Sensors
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