Profile simulation of negative resist MRS using the SAMPLE photolithography simulator

The profile simulation of a negative deep UV resist, MRS (micro-resist for shorter wavelengths), is realized by application of the SAMPLE photolithography process simulator developed on the basis of the modeling of AZ-type positive photoresists. The absence of swelling permits MRS to use the same simulation algorithm as AZ-type resists. Two exposure parameters (A and B) successfully represent the intense light absorption of MRS, and the simulation traces the development process to show the unique undercut profile of MRS.