Bright nickel film deposited by supercritical carbon dioxide emulsion using additive-free Watts bath |
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| Authors: | Tso-Fu Mark Chang Akinobu Shibata Chiemi Ishiyama Yakichi Higo |
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| Affiliation: | Precision and Intelligence Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama, Kanagawa, 226-8503, Japan |
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| Abstract: | This paper is aimed on studying film smoothening effect of supercritical carbon dioxide emulsion (Sc-CO2-E) on nickel film electroplated using an additive-free Watts bath. Morphology of nickel film electroplated with Sc-CO2-E was found to be similar to that of nickel film prepared from electroless plating. Surface roughness (Ra) of nickel film electroplated with Sc-CO2-E was lower than that of nickel film electroplated through conventional method. A minimum Ra was found for nickel film electroplated through conventional method and Sc-CO2-E when increasing current density from 0.010 to 0.150 A/cm2. The minimum Ra was 69.8 nm at 0.020 A/cm2 and 14.0 nm at 0.030 A/cm2, respectively for conventional and Sc-CO2-E case. After the minimum point, increasing rate of Ra increased was lower for Sc-CO2-E case; this was because of higher hydrogen solubility in Sc-CO2. Grain size of nickel film electroplated with Sc-CO2-E was found to be finer than that of conventional case. |
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| Keywords: | Nickel electroplating Supercritical carbon dioxide emulsion Additive-free Watts bath Bright film |
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