The key factor determining the anodic deposition of vanadium oxides

This work demonstrates that anodic deposition of vanadium oxide (denoted as VO_x·nH₂O) can be considered as the chemical co-precipitation of V⁵⁺ and V⁴⁺ oxy-/hydroxyl species and the accumulation of V⁵⁺ species at the vicinity of electrode surface is the key factor for the successful anodic deposition of VO_x·nH₂O at a potential much more negative than the equilibrium potential of the oxygen evolution reaction (OER). The results of in situ UV-vis spectra show that the V⁴⁺/V⁵⁺ ratio near the electrode surface can be controlled by varying the applied potential, leading to different, three-dimensional (3D) nanostructures of VO_x·nH₂O. The accumulation of V⁵⁺ species due to V⁴⁺ oxidation at potentials ≥0.4 V (vs. Ag/AgCl) has been found to be very similar to the phenomenon by adding H₂O₂ in the deposition solution. The X-ray photoelectron spectroscopic (XPS) results show that all VO_x·nH₂O deposits can be considered as aggregates consisting of mixed V⁵⁺ and V⁴⁺ oxy-/hydroxyl species with the mean oxidation state significantly increasing with the applied electrode potential.