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On the relationship between surface roughness evolution and size effects in free-standing Cu films with fine microstructure
Authors:Shakti S. Chauhan  Ashraf Bastawros
Affiliation:1. Micro and Nano Structure Technologies, GE Global Research, One Research Circle, Niskayuna, NY 12309, USA;2. Department of Aerospace Engineering, Iowa State University, Howe Hall, Ames, IA 50010, USA;1. National Institute for Materials Science, Tsukuba, Ibaraki 305-0047, Japan;2. Research Institute for Electromagnetic Materials, Sendai, Miyagi 982-0807, Japan;3. Hokkaido University, Sapporo, Hokkaido 060-8628, Japan;1. HOHAI University, Nanjing 210098, China;2. LML, UMR CNRS 8107, University of Lille, 59655 Villeneuve d’Ascq, France;1. IFIMUP and IN – Institute of Nanosciences and Nanotechnology, Dep. de Física e Astronomia, Faculdade de Ciências da Universidade do Porto, Rua do Campo Alegre, 678, 4169-007 Porto, Portugal;2. LEPABE-Laboratory for Process Engineering, Environment, Biotechnology and Energy, Dep. Engenharia Química-Faculdade de Engenharia da Universidade do Porto, R. Dr. Roberto Frias, 4200?465 Porto, Portugal;1. HOHAI University, Nanjing 210098, China;2. LML, UMR CNRS 8107, University of Lille, Cité Scientifique, 59655 Villeneuve d?Ascq, France;1. Division of Materials Science, Luleå University of Technology, SE-97187 Luleå, Sweden;2. Institut Jean Lamour, University of Lorraine, EEIGM 6 Rue Bastien Lepage, F-54010 Nancy, France;1. Department of Mechanical Engineering, Nanjing Tech University, Nanjing, Jiangsu Province 210009, China;2. Department of Mechanical Engineering, Wuhan Institute of Technology, Wuhan, Hubei Province 430070, China;3. Department of Mechanical and Electronic Engineering, Suzhou Institute of Industrial Technology, Suzhou, Jiangsu 215104, China
Abstract:
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