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Improved dielectric and non-ohmic properties of (Zn + Zr) codoped CaCu3Ti4O12 thin films
Authors:Dong Xu  Xianning Yue  Juan Song  Sujuan Zhong  Jia Ma  Li Bao  Lei Zhang  Sanming Du
Affiliation:1. School of Materials Science and Engineering, Anhui University of Technology, Ma''anshan, 243002, PR China;2. School of Materials Science and Engineering, Jiangsu University, Zhenjiang, 212013, PR China;3. Zhengzhou Research Institute of Mechanical Engineering, Zhengzhou, 450001, PR China;4. School of Materials Science and Engineering, Henan University of Science and Technology, Luoyang, 471000, PR China
Abstract:The good dielectric and non-ohmic properties of CaCu3Ti4O12 and CaCu2.95Zn0.05Ti4-xZrxO12 (x?=?0, 0.05 and 0.10) thin films prepared by a sol-gel method were determined. The enhanced dielectric properties, with a dielectric constant of ε' ≈ 4357 and a dielectric loss of tan δ?≈?0.019, of the CaCu2.95Zn0.05Ti3.95Zr0.05O12 (ZnZr05) thin film at 1?kHz and room temperature were investigated. The XPS spectrum showed that the ZnZr05 film can produce copper vacancies VCu” and mixed valence structures for Cu+/Cu2+ and Ti3+/Ti4+ inside the crystal. The ZnZr05 film maintained a high dielectric constant due to the large grain sizes and the presence of the mixed valence structures, while its low tan δ was attributed to an increase in the VCu” concentration. At the same time, the enhanced nonlinear coefficient (4.2) and low leakage current (193?μA) of the ZnZr05 film were explained in detail.
Keywords:Dielectric constant  Copper vacancy  Mixed valence structure  Non-ohmic property
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