| 直流磁控溅射法低温制备ZnO:Ti透明导电薄膜及特性研究 |
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| 引用本文： | 刘汉法,张化福,袁玉珍,袁长坤,类成新.直流磁控溅射法低温制备ZnO:Ti透明导电薄膜及特性研究[J].液晶与显示,2009,24(6). |
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| 作者姓名： | 刘汉法 张化福 袁玉珍 袁长坤 类成新 |
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| 作者单位： | 山东理工大学,理学院,山东,淄博,255049 |
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| 基金项目： | 山东理工大学创新团队支持计划 |
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| 摘 要： | 利用直流磁控溅射法在室温水冷玻璃衬底上制备出了可见光透过率高、电阻率低的掺钛氧化锌(ZnO:Ti)透明导电薄膜.SEM和XRD研究结果表明,ZnO:Ti薄膜为六角纤锌矿结构的多晶薄膜,且具有c轴择优取向.厚度为437 nm薄膜的电阻率为1.73×10~(-4) Ω·cm.所制备薄膜具有良好的附着性能,薄膜样品在500～800 nm的可见光平均透过率都超过了91%.
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| 关 键 词： | ZnO:Ti薄膜 透明导电薄膜 磁控溅射 光电性能 |
Growth and Properties of Transparent Conducting ZnO:Ti Films by DC Magnetron Sputtering at Low Temperature |
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| LIU Han-fa,ZHANG Hua-fu,YUAN Yu-zhen,YUAN Chang-kun,LEI Cheng-xin.Growth and Properties of Transparent Conducting ZnO:Ti Films by DC Magnetron Sputtering at Low Temperature[J].Chinese Journal of Liquid Crystals and Displays,2009,24(6). |
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| Authors: | LIU Han-fa ZHANG Hua-fu YUAN Yu-zhen YUAN Chang-kun LEI Cheng-xin |
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| Abstract: | Transparent conducting titanium-doped zinc oxide films with high transparency and relatively low resistivity have been successfully prepared by DC magnetron sputtering at room temperature. SEM and XRD studies revealed that all the films were polycrystalline with a hexagonal structure and a preferred orientation along the c-axis. The resistivity achieved was 1.73×10~(-4) Ω·cm at a thickness of 437 nm.All the films present a high transmittance of above 91% in the visible range. |
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| Keywords: | Ti-doped zinc oxide films transparent conducting films magnetron sputtering optic-electronic properties |
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