Nano-structural characteristics of Ti/glass and Ti/Mo films as a function of deposition rate and angle of incidence |
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| Affiliation: | 1. Centro de Física, Universidade do Minho, 4710-057 Braga, Portugal;2. Instituto Pedro Nunes, Laboratório de Ensaios, Desgaste e Materiais, Rua Pedro Nunes, 3030-199 Coimbra, Portugal;3. SEG-CEMUC, Mechanical Engineering Department, University of Coimbra, 3030-788 Coimbra, Portugal;4. Department of Control Engineering, Faculty of Electrical Engineering, Czech Technical University in Prague, Technická 2, Prague 6, Czech Republic;5. Engineering Materials, University of Southampton, Highfield, SO17 1BJ Southampton, UK;6. Instituto Superior Técnico, Universidade Técnica de Lisboa, E.N. 10, 2686-953 Sacavém, Portugal;7. Institut Pprime, UPR 3346-CNRS-Université de Poitiers-ENSMA, SP2MI, téleport2, Bd M. et Pierre Curie, BP 30179, 86962 Futuroscope-Chasseneuil, France;8. Physics Sciences Laboratory, Norte Fluminense State University, 28013-602 Campos, RJ, Brazil;9. Universidade do Porto, Faculdade de Engenharia, Departamento de Engenharia Metalúrgica e de Materiais, Rua Roberto Frias, s/n, 4200-465 Porto, Portugal;1. Tianjin Key Laboratory of Materials Laminating Fabrication and Interface Control Technology, Hebei University of Technology, Tianjin 300130, China;2. National Key Laboratory for Precision Hot Processing of Metals, School of Materials Science and Engineering, Harbin Institute of Technology, Harbin 150001, China;3. Laboratory for Corrosion and Protection, Institute of Metal Research, Chinese Academy of Sciences, Wencui RD 62, Shenyang 110016, China;1. College of Physics and Engineering, Chengdu Normal University, Chengdu 611130, China;2. School of Materials Science and Engineering, Hainan University, Haikou 570228, China;3. Key Laboratory of Advanced Technologies of Materials, Ministry of Education, School of Materials Science and Engineering, Southwest Jiaotong University, Chengdu 610031, China |
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| Abstract: | Titanium films of 90 nm thickness were deposited under UHV condition at different deposition rates, ranging from 0.3 to 10.2 Å s? 1, at room temperature on glass and Mo substrates at two incidence angles of 8.5° and 45°. The samples were analyzed using XRD and AFM techniques. The grain sizes were obtained from AFM images, while the crystallite sizes and preferred orientation of the films were obtained from XRD profiles. Results show that Ti/glass films at 8.5° angle of incidence show (002) preferred orientation, while at 45° incidence angle, at lower deposition rates, films show an almost amorphous structure, which develops to a strong (002) preferred orientation for deposition rate of 1.6 Å s? 1, and again at much higher deposition rate of 10.2 Å s? 1 it changes to an amorphous structure. Ti/Mo films deposited at 45° incidence angle showed (101) preferred orientation. |
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