| ITO玻璃在线等离子体清洗的研究 |
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| 引用本文： | 吴桂初,王德苗,任高潮,陈抗生. ITO玻璃在线等离子体清洗的研究[J]. 真空科学与技术学报, 2001, 21(6): 499-500 |
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| 作者姓名： | 吴桂初 王德苗 任高潮 陈抗生 |
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| 作者单位： | 1. 温州师范学院物理系,温州,325027
2. 浙江大学信息与电子工程系,杭州,310027 |
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| 摘 要： | 通过在线等离子体清洗的玻璃基片表面沉积的ITO(或SiO2)膜,不仅具有优良的光电特性,而且提高了膜层在基片上的附着力.与未经在线等离子体清洗的基片沉积的ITO膜相比,膜层附着力提高了3.5倍.此项成果已在ITO膜透明导电玻璃连续生产线上得到应用.
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| 关 键 词： | 等离子体 表面处理 ITO 膜 附着力 |
| 文章编号： | 0253-9748(2001)06-0499-02 |
| 修稿时间： | 2001-01-12 |
On-line Plasma Cleaning of Glass Substrates of ITO Film |
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| Wu Guichu. On-line Plasma Cleaning of Glass Substrates of ITO Film[J]. JOurnal of Vacuum Science and Technology, 2001, 21(6): 499-500 |
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| Authors: | Wu Guichu |
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| Abstract: | A novel industrial on-line Plasma cleaning technique has been developed to clean the glass substrates before ITO film grown.The advantages of the technique include higher quality ITO films growth, stronger (3.5 times higher )interface cohesion than the conventional surface cleaning. |
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| Keywords: | Plasma Surface processing ITO films Cohesion |
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