| As离子束混合形成硅化钨的卢瑟福背散射分析 |
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| 引用本文： | 王忠烈,丁训良,钱亚宏.As离子束混合形成硅化钨的卢瑟福背散射分析[J].核技术,1986(5). |
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| 作者姓名： | 王忠烈 丁训良 钱亚宏 |
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| 作者单位： | 北京师范大学低能核物理研究所
(王忠烈，丁训良)，北京师范大学低能核物理研究所(钱亚宏) |
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| 摘 要： | 本工作用卢瑟福背散射研究了离子束混合方法形成硅化钨的条件。通过对热烧结和离子束混合法的比较,结合X射线衍射分析相结构的结果,指出离子束混合法可降低形成二硅化钨所需的退火温度。观察到氧杂质对形成条件的影响,简单讨论了离子束混合形成硅化物的机理。
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| 关 键 词： | 离子束混合 难熔金属硅化物 热烧结 卢瑟福背散射 |
An investigation of the tungsten silicide formed by As ion beam mixing with Rutherford backscattering |
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| Wang Zhonglie Ding Xunliang Qian Yahong.An investigation of the tungsten silicide formed by As ion beam mixing with Rutherford backscattering[J].Nuclear Techniques,1986(5). |
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| Authors: | Wang Zhonglie Ding Xunliang Qian Yahong |
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| Abstract: | The conditions of forming tungsten silicide with As ion beam mixing have been studied by means of Rutherford backscattering. The comparison between sintering and ion beam mixing has been performed. The phases have been also identified by X-ray diffraction. The results demonstrated that the refractory metal silicide may be formed at a Teduced reaction temperature using ion beam mixing, technique. The effect of oxygen impurity on silicide formation has been observed. Finally, the mechanism on the formation of the silicide by ion beam mixing is simply discussed. |
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| Keywords: | ion beam mixing refractory metal silicide sintering Rutherford backscattering |
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