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Electrochemical corrosion behavior of nickel coating with high density nano-scale twins (NT) in solution with Cl |
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| Authors: | Feilong Sun Tao Zhang Yawei Shao Fuhui Wang Chaofang Dong |
| Affiliation: | a Corrosion and Protection Laboratory, Key Laboratory of Superlight Materials and Surface Technology, Harbin Engineering University, Ministry of Education, Nantong ST 145, Harbin 150001, China b State Key Laboratory for Corrosion and Protection, Institute of Metal Research, Chinese Academy of Sciences, Wencui RD 62, Shenyang 110016, China c Corrosion and Protection Center, University of Science and Technology Beijing, Beijing 100083, China |
| Abstract: | In this work, a nickel coating with high density nano-scale twins (NT) was synthesized on Q235 steel by using pulsed electrodeposition technique. The effects of NT structure on pitting corrosion resistance and semi-conducting properties of passive films formed on pure Ni in borate buffer solution with chloride ions were investigated by the potentiodynamic polarization measurements and capacitance measurements. The results indicated that the passive films formed on NT coatings showed higher pitting corrosion resistance and a bi-layer semi-conducting structure distribution, comparing with those formed on industrial electrodeposited (IE) nickel. The passive films are p-type semi-conductors at low potentials, but they show an n-type semi-conductor behavior at high potentials. It demonstrated that NT structure decreased vacancy diffusion velocity and slowed down the growth of passive films consequently. This led to the enhancement of pitting resistance for NT nickel. |
| Keywords: | Nano-scale twins Pitting corrosion Passive films Mott-Schottky (M-S) relationship Vacancy diffusion coefficient |
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