金属铜薄膜的制备与红外发射率特性研究

利用化学镀铜工艺，以次亚磷酸钠为还原剂，在普通平板玻璃表面制备了金属铜薄膜。用扫描电子显微镜，X射线衍射仪，四探针电阻仪，红外光谱辐射计等对薄膜的表面形貌、晶体结构和光电特性进行了表征，重点研究了金属铜膜的红外发射率与波长以及电阻率的变化关系，并与经典的Hagen—Rubens关系式进行了对比。结果表明：铜膜的发射率随波长的增大而降低，在特定的波段，发射率随电阻率的升高而增大。

Preparation of Metal Cu Film and the Research of the Infrared Emissivity Properties

Metal Cu films were prepared on plate glass by an electroless plating technique with sodium hypophosphite as a reducing agent.The morphologies of surface,crystalline structure and optoelectronic properties were characterized by SEM,XRD,four-point probe resistance test system and infrared spectrum radiometer.The resent paper paid more attention to study the change relation of infrared emissivity and resistivity of metal Cu films as well as the wavelength,and also has been compared with the classics Hagen-Rub...