离子注入与离子束混合两用机

早在1979年,为了解决应用于高温高真空环境下的轴承的自润滑问题,我们就着手采用

A dual-purpose machine of ion implantation and ion beam mixing

The dual-purpose machine of ion implantation and vacuum evaporation-ion beam mixing developed by the university can generate beam current of middle intensity in large area. It has the directional evaporation source which possesses high heat efficiency and can save the raw material and avoid serious pollution to the system. It can automatically scan large target in the chamber for either large or small workpieces. The conventional mass analyser and special acceleration-focussing lenses can be saved. Simple structure, convenient operation, lower price and higher economic benefit make the feature of this machine. It can be used as a means of research or production for new material. It also can be used in surface modification of non-semiconductors material and in ion beam irradiation of seeds of plants.