| 双反射面形成光驻波场的研究 |
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| 引用本文： | 陈献忠,陈元培,姚汉民,冯伯儒,李展. 双反射面形成光驻波场的研究[J]. 微细加工技术, 2001, 0(3): 51-55 |
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| 作者姓名： | 陈献忠 陈元培 姚汉民 冯伯儒 李展 |
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| 作者单位： | 中国科学院 |
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| 基金项目： | 中国科学院知识创新工程资助项目(A2K0009) |
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| 摘 要： | 分析了镜面的反射系数与光驻波场的关系，详细讨论了影响双反射面形成的驻波场的各种因素，并对TE波和MT波驻波场的光强分布进行了模拟和比较，最后得到了一些对实验有指导意义和结论。
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| 关 键 词： | 光驻波场 反射系数 计算机模拟 反射面 纳米技术 |
| 文章编号： | 1003-8213(2001)03-0051-05 |
| 修稿时间： | 2000-10-30 |
Study on Light Standing-wave Field Caused by Two Reflectors |
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| CHEN Xian?zhong,CHEN Yuan?pei,YAO Han?min,FENG Bo?ru,LI Zhan. Study on Light Standing-wave Field Caused by Two Reflectors[J]. Microfabrication Technology, 2001, 0(3): 51-55 |
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| Authors: | CHEN Xian?zhong CHEN Yuan?pei YAO Han?min FENG Bo?ru LI Zhan |
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| Abstract: | The relation between reflectance of reflector and light intensity distribution of standing?wave field is analyzed.Various factors that influence light standing?wave field formed by two reflectors are discussed in detail,and light intensity distributions of TE wave and TM wave are simulated and compared respectively.Many instructive conclusions about light standing?wave in nanofabrication are drawn,which will do good to experiment. |
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| Keywords: | Light standing?wave Reflectance Light intensity Computer simulation |
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