Interdiffusion and Phase-Boundary Reaction Between Silicate Glass Surface and Aqueous CsCl Solution

Technical silicate glass samples with fresh fracture surfaces or HF-etched surfaces were treated in aqueous CsCl at 90°C for 10 to 85 min. Reaction profiles were determined quantitatively using a SIMS technique. The Cs₂O concentration at the glass surface increased with increasing time, followed by penetration of Cs⁺ ions into the glass. The profiles can be described assuming a model which contains both a surface phase-boundary process and an interdiffusion process in the glass for which D=5.10⁻¹⁷ cm² s⁻¹.