| 表面活性剂在IC芯片光刻工艺中的应用 |
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| 引用本文： | 贺开矿.表面活性剂在IC芯片光刻工艺中的应用[J].半导体技术,2005,30(3):24-26. |
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| 作者姓名： | 贺开矿 |
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| 作者单位： | 杭州士兰集成电路有限公司,杭州,310018 |
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| 摘 要： | 叙述了表面活性剂的性质、分类、分子结构特点,重点介绍了表面活性剂在光刻工艺的涂胶、显影、湿刻工序中的应用.适当加入表面活性剂,在现有设备的条件下可极大地提高光刻质量,对双极电路以及CMOS电路制作都有着重要的现实意义.
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| 关 键 词： | 表面活性剂 表面张力 光刻 显影 湿法腐蚀 |
| 文章编号： | 1003-353X(2005)03-0024-03 |
| 修稿时间： | 2004年4月16日 |
Application of Surfactant in the Optical Lithography Technology for IC Chip |
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| HE Kai-kuang.Application of Surfactant in the Optical Lithography Technology for IC Chip[J].Semiconductor Technology,2005,30(3):24-26. |
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| Authors: | HE Kai-kuang |
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| Abstract: | The property of surfactant, classify,molecule configuration are narrated. The application of surfactant in the working of coating with photoresist, development, wet etching in the Optical lithography technology are introduced. The quality of optical lithography technology with the existing equipments is remarkably improved. It is useful to the production of double-pole circuits and CMOS circuits. |
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| Keywords: | surfactant surface tension optical lithography development wet etching |
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