| Abstract: | Currently, the vacuum arc deposition (VAD) technique is well established in industry, primarily to deposit wear protective hard coatings such as metal nitrides and carbides onto tools and components. From the beginning of the industrial development of the vacuum arc deposition, it was obvious that the emission of macroparticles or droplets is a fundamental drawback of this coating technology. The emission is caused by the highly dynamic process of plasma generation and limits the fields of application significantly. Different methods have been proposed to minimize the macroparticle flux to the substrate surface. But the only way to hinder droplets from reaching the substrate reliable is to separate the plasma from particles by using curved magnetic fields. This filtered arc technique has proven its superiority of depositing high quality films compared to conventional arc applications in numerous laboratory tests. Current demands have stimulated new developments at the Fraunhofer IWS of more compact and higher productive filtered arc sources. One important application of ultra thin protective films is the topcoat on hard disks. In order to increase the storage density, the head‐to‐media spacing as well as the thickness of the overcoat has been reduced continuously. Until now, the thickness of the sputtered films was reduced to about 4 nm. The limit for this technology seems to be achieved. Filtered arc deposition is one of the most promising candidates for the deposition of thinner films – down to 1.3 nm with an even improved mechanical and chemical resistance. Another application area is the manufacturing of metallic lines and interconnections with high aspect ratios in the deep sub‐micron region in microelectronics. The excellent properties of this new filtered source for the deposition of conducting lines in microelectronics were been demonstrated. Actually, the technology for the subsequent deposition of barrier films and conducting wires is under development. Besides the micro technologies, there are a lot of applications requiring higher quality but not (yet) such a perfect film surface. Therefore, using a quite simple filter design – the so‐called Venetian blind filter – a filter unit was developed which can be used at the common industrial vacuum arc deposition machines. The filter does not reduce the deposition area, so the standard deposition processes can be used furthermore. With this filter, the number of droplets can reduced dramatically. A plasma transmission through the filter of approximately 20 % could be measured. Such filter module was realized and is in use now. |
