OVPD und Anwendung optischer Spektroskopiemethoden zur Wachstumskontrolle. OVPD and Applications of Optical Spectroscopic Methods to Growth Control

Organic Vapor Phase Deposition (OVPD) is a new thin film growth technique which is very suitable for deposition of uniform thin films on larger substrate areas. The polarization sensitive methods, ellipsometry and Reflectance Anisotropy Spectroscopy (RAS), have huge potential for the control of the growth in the OVPD process. The capability of ellipsometry to determine the thickness and the optical constants of OVPD deposited films was demonstrated using as example an Alq₃ film. RAS showed high potential for the detection of very thin organic anisotropic films, as exemplified for an PTCDA film.