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Mesoscopic and submicroscopic patterning in thin polymer films: Impact of the solvent
Affiliation:1. The College of Judea and Samaria, The Laboratory of Polymer Materials, Ariel, 44837, Israel;2. Technion, Technion City 32000, Faculty of Mechanical Engineering, Haifa, Israel;1. State Key Laboratory of Chemical Resource Engineering, Beijing University of Chemical Technology, Beijing 100029, China;2. Beijing Key Laboratory of Clothing Materials R & D and Assessment, Department of Materials Science & Engineering, Beijing Institute of Fashion Technology, Beijing 100029, China;3. Chair of Materials Science, Otto Schott Institute of Materials Research, Faculty of Physics and Astronomy, Friedrich Schiller University Jena, Löbdergraben 32, 07743 Jena, Germany;1. Graduate School of Environmental Studies, Tohoku University, Aramaki Aza Aoba 6-6-11, Aoba, Sendai 980-8579, Japan;2. Research Center of Supercritical Fluid Technology, Tohoku University, Aramaki Aza Aoba 6-6-11, Aoba-ku, Sendai 980-8579, Japan;3. Laboratory of Inorganic Materials Chemistry, Schuit Institute of Catalysis, Department of Chemical Engineering and Chemistry, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, the Netherlands;4. College of Environmental Science and Engineering, Nankai University, No. 38, Tongyan Road, Jinnan District, Tianjin 300350, China;1. Polymer Science Unit, School of Materials Science, Indian Association for the Cultivation of Science, Jadavpur, Kolkata 700032, India;2. Organic and Medicinal Chemistry Division, CSIR-Indian Institute of Chemical Biology, Jadavpur, Kolkata 700032, India;3. Department of Bioscience & Bioengineering, Indian Institute of Technology, Jodhpur, Rajasthan 342037, India;4. Department of Chemistry, Presidency University, Kolkata 700 073, India
Abstract:Formation of mesoscopic and submicrometric self-assembled patterns in polystyrene and polycarbonate films produced by a fast dip-coating process was studied. Mixtures of chloroform and dichloromethane were used as a solvent. The mixture's composition plays a decisive role in the patterning. Close-packed honeycomb structures comprised of 200–2000 nm pores dispersed in polymer matrix were obtained. The mechanism of self-assembling is discussed.
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