Electrodeposition of SmS optical thin films on ITO glass substrate |
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Authors: | Jian-feng Huang Xiao-bo Ma Jian-peng Wu |
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Affiliation: | School of Materials Science and Engineering, Shaanxi University of Science and Technology, Xi'an, Shaanxi, P. R. China, 710021 |
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Abstract: | SmS optical thin films were deposited on the surface of ITO glass with an electrodeposition method using aqueous solution containing SmCl3·6H2O and Na2S2O3·5H2O. The phase composition was analyzed by X-ray diffraction (XRD) and microstructure of the film was characterized by atomic force microscope (AFM). It is showed that SmS thin film could be obtained in the solution with n(Sm)/n(S) = 1:4, pH = 4.0 and annealing in Ar atmosphere at 200 °C for 0.5 h. The as-prepared thin films on the ITO glass exhibit a dense microstructure. The band gap of the thin film has been found to be 3.6 eV. |
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Keywords: | Atomic force microscopy Crystal structure Thin films Electrodeposition |
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