Study on the Hall-effect and photoluminescence of N-doped p-type ZnO thin films |
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Authors: | YJ Zeng WZ Xu Y Che BH Zhao |
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Affiliation: | a State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou 310027, People's Republic of China b IMRA America, Inc., 1044 Woodridge Ave. Ann Arbor, Michigan, 48105, USA |
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Abstract: | N-doped, p-type ZnO thin films have been grown by plasma-assisted metal-organic chemical vapor deposition method. The results under optimized growth conditions included a resistivity of 1.72 Ω cm, a Hall mobility of 1.59 cm2/V s, and a hole concentration of 2.29 × 1018 cm− 3, and were consistently reproducible. A N-related free-to-neutral-acceptor emission and an associated phonon replica were evident in room temperature photoluminescence spectra, from which the N acceptor energy level in ZnO was estimated to be 180 meV above the valence band maximum. |
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Keywords: | 61 72 V 72 80 E 73 61 G 78 66 H |
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