Effect of annealing on the composition, structure and mechanical properties of carbon nitride films deposited by middle-frequency magnetron sputtering |
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Authors: | ZH Huang CS Liu XJ Fan |
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Affiliation: | a Accelerator Laboratory, School of Physics, Wuhan University, Wuhan 430072, China b School of Power & Mechanical Engineering, Wuhan University, Wuhan 430072, China |
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Abstract: | Carbon nitride films were deposited by middle-frequency reactive magnetron sputtering and annealed at different temperatures in nitrogen ambient. X-ray photoelectron spectroscopy, Raman scattering, transmission electron microscopy, and nano-indenter were used to characterize the as-deposited and annealed films. The analysis showed that annealing resulted in the dissociation of N and C in the films. The dissociation of C happened after 500 °C and lagged behind that of N. With the increase of annealing temperature, the disorder of sp2 C decreased and the films were gradually graphitized. The microstructure changed from amorphous to fullerene-like CNx with the annealing temperature increasing to 500 °C, and then to nitridized graphite nanocrystals at 600 °C. The graphitization resulted in a drastic decreasing of hardness and modulus of the films. |
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Keywords: | Carbon nitride Thermal properties Nanocrystal Microstructure Hardness |
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