Tris(dialkylamino)aluminums: Syntheses, characterization, volatility comparison and atomic layer deposition of alumina thin films |
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| Authors: | Casey R. Wade Chiranjib Banerjee James McAndrew |
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| Affiliation: | a American Air Liquide, 5230 S. East Ave., Countryside IL 60525, USA
b Department of Chemistry and Center for Materials Research, University of Nebraska-Lincoln, Lincoln, NE 68588-0304, USA |
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| Abstract: | The syntheses and characterization of both tris(diethylamino)aluminum and tris(diisopropylamino)aluminum are presented in this letter. Characterization includes vapor pressure measurements and comparison of the two non-pyrophoric precursors showing them to be viable alternatives to trimethylaluminum. Ultimately, tris(diisopropyl)aluminum was successful in the atomic layer deposition of alumina thin films. |
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| Keywords: | Aluminum Precursors Alumina Vapor pressure Thin films Atomic layer deposition |
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