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Deposition of hydroxyapatite thin films by Nd:YAG laser ablation: a microstructural study |
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| Authors: | L.C. Nistor V.S. Teodorescu M. Dinescu N. Frangis C. Liutas |
| Affiliation: | a National Institute of Materials Physics, P.O. Box MG-7, Magurele, RO-76900, Bucharest, Romania b National Institute of Lasers, Plasma and Radiation Physics, P.O. Box MG-26, Magurele, RO-76900, Bucharest, Romania c Aristotle University of Thessaloniki, Department of Physics, GR-54124 Thessaloniki, Greece |
| Abstract: | Hydroxyapatite (HA) thin films has been successfully deposited by Nd:YAG laser ablation at λ = 532 nm. The morphology and microstructure of the deposited layers was studied by scanning electron microscopy (SEM), transmission electron microscopy (TEM) and high resolution electron microscopy (HREM). Polycrystalline HA films were directly obtained with the substrate at 300 °C and without introducing water vapors in the deposition chamber. Electron paramagnetic resonance (EPR) measurements show that the oxygen stoichiometry in the HA films is also maintained. Depositions performed at λ = 335 nm laser wavelength and 300 °C substrate temperature resulted in polycrystalline layers of mixed composition of HA and tricalciumphosphate (TCP). |
| Keywords: | A. Inorganic material B. Laser deposition C. Electron microscopy D. Crystal structure |
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