Microanalyses on the hydrogen permeated 70% SiCC films |
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Authors: | NK Huang DZ Wang YG Liu JR Liu |
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Affiliation: | Key Laboratory for Radiation Physics and Technology of Education Ministry of China, Institute of Nuclear Science and Technology, Sichuan University, Chengdu 610064, PR China |
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Abstract: | SiCC films with content of 70% SiC were deposited by rf magnetron sputtering on stainless steel or NaCl substrate followed by argon ion bombardment. Samples were then submitted to hydrogen permeation at 3.23×107 Pa and 500 K for 3 h. Secondary ion mass spectroscopy (SIMS) was used to analyze hydrogen concentration with depth and to check the formation of hydrogen related bonds in the SiCC films with IR measurement. Auger electron spectra (AES) and X-ray photoelectron spectra (XPS) were carried out to check the effects of hydrogen participation on shifts of chemical bonding states of C, Si and O contamination. |
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Keywords: | A Carbides A Thin films A Hydrides |
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