| 固态Si颗粒在Na2O-CaO-SiO2多孔微晶玻璃中氧化的均匀性 |
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| 引用本文： | 严明明,曹建尉,王志,李国华. 固态Si颗粒在Na2O-CaO-SiO2多孔微晶玻璃中氧化的均匀性[J]. 过程工程学报, 2018, 18(1): 165-170. DOI: 10.12034/j.issn.1009-606X.217223 |
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| 作者姓名： | 严明明 曹建尉 王志 李国华 |
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| 作者单位： | 1. 中国矿业大学(北京)材料科学与工程系，北京 100083；2. 中国科学院过程工程研究所矿产资源绿色过程工程研究部，北京 100190 |
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| 基金项目： | 固态硅调控硅渣多孔微晶玻璃气孔结构机制;高效结晶增值冶金;抛光渣制结构功能一体化多孔微晶玻璃 |
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| 摘 要： | 加入固态Si颗粒为Na2O?CaO?SiO2(NCS)多孔微晶玻璃配合料的气泡成核质点以调控孔结构，研究了固态Si颗粒在NCS配合料形成熔体过程中的氧化行为，用ANSYS模型模拟了NCS多孔微晶玻璃配合料的热场分布. 结果表明，固态Si颗粒在NCS熔体形成过程中的氧化始于650℃，固态Si颗粒具有促进NCS配合料热场均匀分布的作用，且在NCS熔体形成过程中氧化程度相同，氧化过程不会影响NCS多孔微晶玻璃孔径分布的均匀性.
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| 关 键 词： | 多孔微晶玻璃 固态Si颗粒 热场分布 氧化 均匀性 |
| 收稿时间： | 2017-04-25 |
Homogeneity of Solid Si Particle Oxidation in Na2O-CaO-SiO2 Porous Glass-ceramics |
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| Mingming YAN Jianwei CAO Zhi WANG Guohua LI. Homogeneity of Solid Si Particle Oxidation in Na2O-CaO-SiO2 Porous Glass-ceramics[J]. Chinese Journal of Process Engineering, 2018, 18(1): 165-170. DOI: 10.12034/j.issn.1009-606X.217223 |
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| Authors: | Mingming YAN Jianwei CAO Zhi WANG Guohua LI |
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| Affiliation: | 1. Department of Materials Science and Engineering, China University of Mining and Technology (Beijing), Beijing 100083, China; 2. Department of Mineral Resources, Green Process Engineering Research, Institute of Process Engineering, Chinese Academy of Sciences, Beijing 100190, China |
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| Abstract: | Addition solid Si particle as bubbe nucleation spots to adjust the pore structure of Na2O?CaO?SiO2 (NCS) porous glass-ceramics, the oxidation behavior of Si in NCS porous glass-ceramics was studied, its effect on the thermal field distribution of NCS porous glass-ceramics was simulated by ANSYS model. The results showed that the oxidation of solid Si particle started at 650℃ in NCS porous glass-ceramics, and the thermal field distribution of NCS porous glass-ceramics gets uniform with the addition of solid Si particle, so that the oxidation degree of solid Si particle in NCS porous glass-ceramics are same, it won?t affect the pore size distribution of NCS porous glass-ceramics. |
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| Keywords: | porous glass-ceramics solid Si particle thermal field distribution oxidation homogeneity |
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