光盘反射层纳米A1膜性能研究

利用原子力显微镜（AFM）和椭圆偏振仪研究了溅射条件对纳米Al薄膜性能的影响。研究表明，随溅射Ar气压的增大，纳米Al膜的表面粗糙度增加，折射率降低，反射率减小，这与薄膜的结构变化密切相关；随溅射功率的增大，纳米Al膜的表面粗糙度增加，而其光学常数的变化则不明显。

The Characteristics of Al Nano-films Used as Optical Disk Reflective Layer

The characteristics of Al nano film were studied by using AFM and spectroscopic ellipsometer methods.It was indicated that the surface roughness of sputtered Al nano film,from 1.216 nm(rms) at 0.4 Pa to 3.521 nm at 1.6 Pa,is proportional to the sputtering Ar pressure.The refractive index,extinction coefficient and reflectivity of Al nano film all decrease as the sputtering Ar pressure increases.The above phenomenon is related to the change of Al nano film structure.In most cases,the reflectivity of Al nano film is more than 85 %.It was also indicated that the surface roughness of sputtered Al nano film increases when the sputtering power increases,from 0.486 nm at 1 000 W changing to 2.014 nm at 2 500 W.However the optical constants of Al nano film are not sensitive to the sputtering power.