| 氧杂质及热处理过程对Ge-Sb-Te薄膜的光学性质和晶体结构的影响 |
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| 引用本文： | 顾四朋,侯立松,刘波,陈静.氧杂质及热处理过程对Ge-Sb-Te薄膜的光学性质和晶体结构的影响[J].中国激光,2003,30(12):1111-1115. |
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| 作者姓名： | 顾四朋 侯立松 刘波 陈静 |
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| 作者单位： | 1. 中国科学院上海光学精密机械研究所,上海,201800
2. 中国科学院上海技术物理所红外物理国家实验室,上海,200083 |
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| 基金项目： | 国家自然科学基金 (5 9832 0 6 0 )重点资助项目 |
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| 摘 要： | 研究了氧掺杂Ge Sb Te磁控溅射相变薄膜在 4 0 0～ 80 0nm区域的光学常数 (n ,k) ,发现不同氧成分薄膜的光学性质有较大差别 ,经过热处理后薄膜的光学性质也发生了较大变化。由热处理前后薄膜的X射线衍射 (XRD)发现 ,经过退火处理后薄膜发生了从非晶态到晶态的相变。由薄膜内应力变化和薄膜的结构变化解释了薄膜光学性质的变化
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| 关 键 词： | 薄膜物理学 Ge-Sb-Te薄膜 氧杂质 光学常数 X射线衍射 |
| 收稿时间： | 2001/10/12 |
Optical and Structural Properties of Oxygen-doped and Annealed Ge-Sb-Te Thin Films |
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| GU Si-peng ,HOU Li-song ,LIU Bo ,CHEN Jing.Optical and Structural Properties of Oxygen-doped and Annealed Ge-Sb-Te Thin Films[J].Chinese Journal of Lasers,2003,30(12):1111-1115. |
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| Authors: | GU Si-peng HOU Li-song LIU Bo CHEN Jing |
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| Affiliation: | GU Si-peng 1,HOU Li-song 1,LIU Bo 1,CHEN Jing 2 1Shanghai Institute of Optics and Fine Mechanics,The Chinese Academy of Sciences,Shanghai 201800,China 2National Laboratory of Infrared Physics,Shanghai Institute of Technical Physics,The Chinese Academy of Sciences,Shanghai 200083,China |
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| Abstract: | Optical properties of oxygen-doped Ge-Sb-Te thin films prepared by RF-sputtering method in the region of 400～800 nm were studied, including refractive index, extinction coefficient. The results show that optical constants of the Ge-Sb-Te-O films change with oxygen content and heat-treatment. XRD spectra of the films with different oxygen content in the as-deposited and heat-treated states show that the films changed from amorphous to crystalline states due to heat-treatment. The effect of the strain field induced by oxygen-doping on optical properties is discussed. |
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| Keywords: | thin films physics Ge-Sb-Te films oxygen-doping optical constants X-ray diffraction |
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