High‐resolution technology for FPD manufacturing |
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Authors: | Nobuhiko Yabu Kouhei Nagano Nozomu Izumi |
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Affiliation: | Canon Inc., Tokyo, Japan |
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Abstract: | Using shorter wavelength for exposure light is one way to achieve high resolution while keeping sufficient depth of focus. We show exposure results for high resolution to confirm the effect of deep UV exposure light. With deep UV light, 1.2‐µm line and space pattern and 1.8‐µm contact hole pattern are resolved while keeping sufficient depth of focus. |
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Keywords: | Lithography FPD high resolution CAR |
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