Thickness measurement in ultrathick multilayer microstructures |
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Authors: | Rainer Engelke Uwe Richter |
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Affiliation: | 1. micro resist technology GmbH, Koepenicker Str. 325, 12555, Berlin, Germany 2. Sentech Instruments GmbH, Schwarzschildstrasse 2, 12489, Berlin, Gemany
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Abstract: | Microparts are more and more mass products and quality assurance becomes an important factor in manufacturing. Based on a new optical principle, a tool was developed and tested which is well suited for easy non-destructive measurements at microstructures as well as for measurement at transparent layers. Thickness measurement of ca. 1 mm ultrathick photoresist layers on non-patterned high-reflective gold surface was demonstrated. As well, measurement of multi layer systems consisting of each several hundred micrometers thick transparent layers was verified at capped microfluidic channel structures. |
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