| 降低超大规模集成电路用高纯水中总有机碳的能量传递光化学模型 |
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| 引用本文： | 闻瑞梅,梁骏吾. 降低超大规模集成电路用高纯水中总有机碳的能量传递光化学模型[J]. 电子学报, 2003, 31(11): 1601-1604 |
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| 作者姓名： | 闻瑞梅 梁骏吾 |
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| 作者单位： | 1. 同济大学,上海 200092;2. 中科院半导体所,北京 100083 |
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| 摘 要： | 本文提出用185nm紫外线降低高纯水中总有机碳(TOC)的能量传递光化学模型.计算了水的流量、TOC的浓度、照射腔的尺寸与所需紫外光能量的关系,从而解决了在工程设计中185nm紫外灯的选择和计算方法.根据理论计算出的结果和实验十分一致,证实了本模型的正确性.使高纯水中的TOC由4200μg/l 降至0.3μg/l,是目前国内外高纯水中TOC浓度的最好水平.
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| 关 键 词： | 超大规模集成电路 总有机碳 185纳米紫外 光化学 |
| 文章编号： | 0372-2112(2003)11-1601-4 |
| 收稿时间： | 2002-09-28 |
An Energy Transfer Photochemical Model for the Abatement of Total Organic Carbon in High Purity Water Used in ULSI Fabrication |
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| WEN Rui-Mei ,LIANG Jun-Wu. An Energy Transfer Photochemical Model for the Abatement of Total Organic Carbon in High Purity Water Used in ULSI Fabrication[J]. Acta Electronica Sinica, 2003, 31(11): 1601-1604 |
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| Authors: | WEN Rui-Mei LIANG Jun-Wu |
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| Affiliation: | 1. Tongji University,Shanghai 200092,China;2. Institute of Semiconductors,Beijing 100083,China |
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| Abstract: | An energy transfer photochemical model for the abatement of total organic carbon(TOC)in high purity water using 185nm Ultraviolet(UV)irradiations is proposed.The dependence of 185nm UV irradiation energy on the water flow rates,TOC concentrations and size of irradiation cell has been established.The models of selection of 185nm UV source and calculation in engineering design have been solved.The theoretical calculation agrees with experiments,which proves the model to be correct.The TOC concentrations in high purity water were decreased from 4200μg/L to 0.3μg/L,which is the lowest concentration of TOC. |
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| Keywords: | ULSI total organic carbon 185nm UV photochemistry |
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