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| 绒面AZO干法制备及性能研究 | |
| 引用本文： | 王文娜,张大伟,陶春先,黄元申,倪争技,庄松林. 绒面AZO干法制备及性能研究[J]. 光电工程, 2012, 39(2): 147-150 |
| 作者姓名： | 王文娜 张大伟 陶春先 黄元申 倪争技 庄松林 |
| 作者单位： | 王文娜:上海理工大学光电信息与计算机工程学院，上海 200093 张大伟:上海理工大学光电信息与计算机工程学院，上海 200093 陶春先:上海理工大学光电信息与计算机工程学院，上海 200093 黄元申:上海理工大学光电信息与计算机工程学院，上海 200093 倪争技:上海理工大学光电信息与计算机工程学院，上海 200093 庄松林:上海理工大学光电信息与计算机工程学院，上海 200093 |
| 基金项目： | 国家自然科学基金 (60908021)、上海市纳米专项 (1052nm07100)、上海市科技启明星 (09QA1404200)、上海市重点学科项目第三期(S30502)、上海市研究生创新基金项目(JWCXSL1102) |
| 摘 要： | 利用射频溅射方法,制得AZO透明导电膜,并用离子束刻蚀制备绒面,得到绒面AZO透明导电膜。比较刻蚀前后光电性能及表面形貌,发现透过率稍有下降,在可见光波段透过率在80%以上;电阻率略有上升,但仍保持在10-3?·cm数量级,最低为2.91×10-3?·cm;刻蚀后薄膜表面形貌变化较大,大多数薄膜表面呈现"坑状"结构,横向尺寸在0.5?1.0μm,开口角在120°左右,表面粗糙度从7.29nm上升到36.64nm。薄膜具有较好的表面微结构,在作太阳能电池前电极方面有较好的应用前景。 |
| 关 键 词： | AZO薄膜 绒面结构 太阳能电池 离子束刻蚀 |
| 收稿时间： | 2011-09-27 |
Preparation and Investigation of Textured AZO Transparent Conductive Thin Film by Directly Dry Etching |
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| WANG Wen-na,ZHANG Da-wei,TAO Chun-xian,HUANG Yuan-shen,NI Zheng-ji,ZHUANG Song-lin. Preparation and Investigation of Textured AZO Transparent Conductive Thin Film by Directly Dry Etching[J]. Opto-Electronic Engineering, 2012, 39(2): 147-150 | |
| Authors: | WANG Wen-na ZHANG Da-wei TAO Chun-xian HUANG Yuan-shen NI Zheng-ji ZHUANG Song-lin |
| Affiliation: | ( School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China ) |
| Abstract: | Aluminum-doped Zinc Oxide (AZO) transparent conductive thin films were prepared by RF sputtering and surface-textured AZO transparent conductive thin films were obtained by using ion etching. Effects of ion etching on the optical, electrical and structural properties of the films were investigated. A slight decrease was found in transmittance, but the transmittance is still more than 80% in the visible spectrum. The resistivity increased slightly, but still at the 10-3.·cm level, the minimum resistivity is 2.91×10-3.·cm. The surface topography changed noticeably after ion etching. Most films show "pit-like" structure, lateral dimensions in the 0.5～1.0 μm, opening angle 120° or so, and Root Mean Square (RMS) roughness increased from 7.29 nm to 36.64 nm. The films have good surface micro-structure, and show a good prospect as solar cells front-electrode. |
| Keywords: | AZO thin film surface-textured solar cell ion etching |
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