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钼薄膜制备技术研究
引用本文:曹德峰,邢丕峰,韦建军,易泰民,杨蒙生,郑凤成. 钼薄膜制备技术研究[J]. 稀有金属材料与工程, 2011, 0(Z2): 588-591
作者姓名:曹德峰  邢丕峰  韦建军  易泰民  杨蒙生  郑凤成
作者单位:四川大学;中国工程物理研究院;
摘    要:具有体密度的高表面质量金属钼薄膜对材料高压状态方程研究具有十分重要的意义。本文介绍了制备钼薄膜的几种方法,包括:机械轧制、机械研磨抛光、化学气相沉积、电子束蒸发、脉冲激光沉积和磁控溅射。综合比较后认为,采用磁控溅射法制备的钼膜可以基本满足状态方程靶用钼(Mo)薄膜的需要。通过磁控溅射沉积方法可以制备出表面质量高,厚度可达几微米的金属Mo薄膜,其组织结构和密度接近块材而且薄膜表面不易出现硬化、沾污等问题。

关 键 词:钼薄膜  制备技术  表面粗糙度  磁控溅射

Research on Molybdenum Film Fabrication
Cao Defeng ,,Xing Pifeng ,Wei Jianjun ,Yi Taimin ,Yang Mengsheng ,Zheng Fengcheng. Research on Molybdenum Film Fabrication[J]. Rare Metal Materials and Engineering, 2011, 0(Z2): 588-591
Authors:Cao Defeng     Xing Pifeng   Wei Jianjun   Yi Taimin   Yang Mengsheng   Zheng Fengcheng
Affiliation:Cao Defeng 1,2,Xing Pifeng 2,Wei Jianjun 1,Yi Taimin 2,Yang Mengsheng 2,Zheng Fengcheng 2 (1. Sichuan University,Chengdu 610065,China) (2. China Academy of Engineering Physics,Mianyang 621900,China)
Abstract:Molybdenum film with theoretical density plays an important role in the Equation of state of materials for ultra high pressure research. In this paper, current preparative techniques of molybdenum thin-film are summarized, including mechanical methods, chemical vapor deposition(CVD), electron beam evaporation, pulsed laser deposition and magnetron sputtering. Comparing these preparation techniques, magnetron sputtering is the best one to satisfy the need of the Equation of state of materials. As there is lo...
Keywords:molybdenum film  preparation technique  surface roughness  magnetron sputtering  
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