| 时间监控离子束溅射沉积光学薄膜的厚度修正 |
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| 引用本文： | 刘洪祥,李凌辉,申林,熊胜明,张云洞.时间监控离子束溅射沉积光学薄膜的厚度修正[J].光学仪器,2004,26(2):91-94. |
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| 作者姓名： | 刘洪祥 李凌辉 申林 熊胜明 张云洞 |
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| 作者单位： | 中国科学院光电技术研究所,四川,成都,610209;中国科学院光电技术研究所,四川,成都,610209;中国科学院光电技术研究所,四川,成都,610209;中国科学院光电技术研究所,四川,成都,610209;中国科学院光电技术研究所,四川,成都,610209 |
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| 摘 要： | 通过单层和多层膜的实验模拟,研究了离子束溅射沉积速率和沉积时间的关系。在溅射镀膜的初始阶段,对于Ta2O5,沉积速率随时间增加而增大;对于SiO2,沉积速率随时间先显著地增加,随后逐渐地减小。结果表明,通过对高、低折射率各层的监控时间进行补偿,即可实现光学薄膜厚度的精确监控。
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| 关 键 词： | 离子束溅射 时间监控 光学厚度 |
| 文章编号： | 1005-5630(2004)02-0091-04 |
| 修稿时间： | 2003年11月30 |
Thickness modify of time-power monitoring of ion beam sputter depositing optical thin films |
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| LIU Hong-xiang,LI Ling-hui,SHEN Lin,XIONG SHeng-ming,ZHANG Yun-dong.Thickness modify of time-power monitoring of ion beam sputter depositing optical thin films[J].Optical Instruments,2004,26(2):91-94. |
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| Authors: | LIU Hong-xiang LI Ling-hui SHEN Lin XIONG SHeng-ming ZHANG Yun-dong |
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| Abstract: | In this paper, the rule of the deposition rate of films and the sputtering time was studied. In the preliminary stage of coating, for Ta_2O_5, its growth rate increases with the depositing time; but, for SiO_2, its growth rate increases firstly, and then decreases. Experiments showed that, by modifying the deposition time of the high-index and the low-index layers, this can realize the accurate thickness control of time-power monitoring of ion beam sputter depositing optical thin films. |
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| Keywords: | ion beam sputter time-power monitoring optical thickness |
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