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Porous organosilicates low-dielectric films for high-frequency devices |
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| Authors: | André Knoesen Ge Song Willi Volksen Elbert Huang Teddie Magbitang Linda Sundberg James L Hedrick Craig J Hawker Robert D Miller |
| Affiliation: | (1) Electrical and Computer Engineering, University of California, 95616 Davis, CA;(2) IBM Almaden Research Center, 95120 San Jose, CA |
| Abstract: | The dielectric properties are reported for nanoporous thin films of poly(methyl silsesquioxane) (MSSQ) for use as an ultralow, dielectric intermetal insulator. Direct experimental conformation is provided that the films have low dielectric constants with low loss up to 10 GHz. Low-frequency measurements are also reported. |
| Keywords: | Dielectric films dielectric measurements nanoporous films permittivity measurement transmission line measurements |
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