| 均匀等离子体与2.45GHz微波相互作用的数值分析 |
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| 引用本文： | 黄平 徐廷献 季惠明. 均匀等离子体与2.45GHz微波相互作用的数值分析[J]. 微波学报, 2004, 20(3): 69-73 |
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| 作者姓名： | 黄平 徐廷献 季惠明 |
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| 作者单位： | 天津大学先进陶瓷与加工技术教育部重点实验室,天津,300072 |
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| 基金项目： | 国家自然科学基金资助 (批准号 :5 9995 5 2 0 6 )，NipponSheetGlassfoundationformaterialsscienceandEngineering(Japan)资助项目 (批准号 :30 1 0 5 5 4 4 ) |
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| 摘 要： | 圆柱形平板等离子体模型在不同磁场强度、不同等离子体密度和不同等离子体碰撞频率下，对2．45GHz微波在均匀等离子体中传播时的吸收、反射和衰减情况进行了数值分析。结果表明：微波能量的吸收对于等离子体密度的变化存在着一个极大值，合适的等离子体密度可以增大等离子体对微波的吸收，减小界面对微波的反射。适当选择等离子体密度和等离子体碰撞频率，可以使均匀等离子体对2．45GHz微波能吸收比达到85％以上。
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| 关 键 词： | 微波能 GH 体模 相互作用 吸收 变化 传播 碰撞频率 等离子体 反射 |
| 文章编号： | 1005-6122(2004)03-0069-05 |
| 修稿时间： | 2003-09-10 |
Numerical Analysis on the Interaction of 2.45GHz Microwave with Uniform Plasma |
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| Huang Ping,Xu Tingxian,Ji Huiming. Numerical Analysis on the Interaction of 2.45GHz Microwave with Uniform Plasma[J]. Journal of Microwaves, 2004, 20(3): 69-73 |
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| Authors: | Huang Ping Xu Tingxian Ji Huiming |
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| Abstract: | Numerical analysis on the absorption, reflection, and attenuation of 2.45GHz mic rowave are studied by uniform plasma cylindrical slab with different values of m agnetic field intensity and various plasma parameters such as plasma density and collision frequency. The calculated results show that there exists a maximum va lue of the absorbed microwave power when the density of plasma varies, and suita ble plasma density can increase the absorbed power of microwave by plasma and re duce the reflected power by the interface. More than 85% of microwave power can be absorbed by uniform magnetized plasma with proper plasma density and proper c ollision frequency of plasma. |
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| Keywords: | Chemical vapor deposition 2.45GHz microwave Hypothermal plasma Numerical analysis |
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