Al/N共掺杂TiO2薄膜的制备及光学性能

采用溶胶-凝胶旋涂法(Sol-Gel Spin-Coating Method)制备了Al掺杂量为3.00at%,N掺杂量分别为6.00at%,7.00at%,8.00at%和9.00at%的Al/N共掺杂TiO₂薄膜样品。对样品测试的结果表明,共掺杂样品依旧保留了TiO₂的基本结构,并且Al/N共掺杂样品的晶粒尺寸有不同程度的减小,使样品表面得以修饰,变得更加均匀、平整。共掺杂样品吸收边都出现了不同程度的红移,在紫外光区以及可见光区的吸光性都有所增强。N掺杂量为7.00at%时,(101)衍射峰值最大,峰型最尖锐,所得到的TiO₂薄膜的光学性能最好。共掺杂后的样品与本征TiO₂相比带隙值都有所减小,且最小值为2.873eV。以上结果表明Al/N共掺杂TiO₂薄膜使其光学性能得到了改善。

Preparation and Optical Properties of Aluminum and Nitrogen Co-doped TiO2 Thin Film

In this study, based on the sol-gel spin coating method, aluminum and nitrogen co-doped TiO₂ film samples were prepared with aluminum doping amount of 3.00at%, and nitrogen doping amount of 6.00at%, 7.00at%, 8.00at%, and 9.00at%, respectively. The test results of the samples show that the basic structure of TiO₂ is still retained in the co-doped samples, and the grain size of aluminum and nitrogen co-doped samples is reduced to different degrees, which makes the surface of the samples modified to become more uniform and flat compared with that of the undoped. The co-doped samples showed different degrees of red shift and enhanced absorbance in both UV and visible regions. When the doping amount of nitrogen is 7.00at%, the diffraction peak of (101) is the largest, the peak type is the sharpiest, and the obtained TiO₂ film has the best optical performance. Compared with the eigenstate TiO₂, the band gap values of the co-doped samples are decreased, and the minimum value is 2.873eV. The above results indicate that Al/N co-doped TiO₂ film can improve its optical properties.