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Effect of phase transitions in copper-germanium thin film alloys on their electrical resistivity
Authors:H M Tawancy  M O Aboelfotoh
Affiliation:(1) Materials Characterization Laboratories, Metrology, Standards, and Materials Division, Research Institute, King Fahd University of Petroleum and Minerals, P.O.Box 1639, 31261 Dhahran, Saudi Arabia;(2) Department of Materials Science and Engineering, North Carolina State University, 27 695-7907 Raleigh, NC, USA
Abstract:An investigation was carried out to study the phase transitions in Cu-Ge thin films (80–200 nm in thickness) containing 0, 5, 15, 20, 25, 30, 35, 40, 45 and 50 at% Ge, and the corresponding effects on electrical resistivity. For these films, the phase transitions were found to follow the sequence: agr-phase (disordered face centred cubic, fcc, solid solution); 5 at% Ge rarr zeta-phase (disordered hexagonal close packed, hcp); 15 at% Ge rarr zeta-phase + epsiv1-phase (ordered orthorhombic, Cu3Ge); 20 at% Ge rarr epsiv1-phase; 25 at% Ge rarr (epsiv1-phase + progressively increasing proportions of a disordered Ge-rich solid solution); 30–50 at% Ge. Germanium was found to have no marked effect on grain size of all films studied excluding grain boundaries as electron scattering centres. Transition of the agr-phase into the zeta-phase was found to occur in a highly coherent manner, which could be related to the reduced stacking fault energy of Cu by the addition of Ge. Most evidence pointed out that the initial increase in resistivity within the agr-phase range was related to hcp scattering centres, which could be associated with a localized high concentration of Ge. At 15 at% Ge, the resistivity reached a maximum value of about 50 mgrOHgr cm associated with the complete transformation of agr-phase into the zeta-phase. With continued increase in Ge concentration, the resistivity was found to gradually decrease reaching a minimum value of about 10 mgrOHgr at 25 at% Ge, which was correlated with complete transition of the zeta-phase into the ordered epsiv1-phase (Cu3Ge). It was shown that the superlattice of Cu3Ge could directly be derived from the disordered zeta-phase by minor atom rearrangement on the 0 0 0 1]hcp plane. Even though, minor proportions of a Ge-rich solid solution containing a small concentration of Cu were formed at Ge concentrations above 25 at%, the minimum resistivity of 10 OHgrmgr cm was maintained as the Ge concentration was increased to 35 at%. Subsequently, the resistivity was increased reaching about 46 mgrOHgr cm at 50 at% Ge.
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