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基于高级氧化技术处理乙烯生产废碱液的研究
引用本文:余政哲 孙德智 史鹏飞 段晓东. 基于高级氧化技术处理乙烯生产废碱液的研究[J]. 东北电力学院学报, 2003, 23(2): 24-27
作者姓名:余政哲 孙德智 史鹏飞 段晓东
作者单位:哈尔滨工业大学环境科学与工程系 黑龙江哈尔滨150001(余政哲,孙德智,史鹏飞),哈尔滨工业大学环境科学与工程系 黑龙江哈尔滨150001(段晓东)
摘    要:研究了UV/H2O2,UV/O3和UV/H2O2/O3三种高级氧化体系处理乙烯装置所排放废碱液的特点。对于UV/H2O2体系,随着H2O2剂量的增加,COD的去除率以及处理液的可生化性(BOD:COD值)都随之增大,其性能也好于单独的H2O2体系,该体系在最佳条件下,COD的去除率达到68%,BOD/COD值从0.22增大到0.52;对于UV/O3体系,随着O3剂量的增加,COD的去除率及处理液的可生化性(BOD:COD值)也都随之增大,其性能也好于单独的O3体系。该体系在最佳条件下,COD的去除率达到54%,可生化性(BOD/COD值)从0.22增大到0.48;对于UV/H2O2/O3体系,其COD去除率比UV/O3体系高出22.0%。

关 键 词:乙烯 生产过程 废碱液 高级氧化技术 光化学反应器 生物法 氧化法
文章编号:1005-2992(2003)02-0024-04
修稿时间:2003-01-13

The Study of Treatment for Organics of Spent Caustic Form Ethene Plant Based on Advanced Oxidation Processes
YU Zheng zhe,SUN De zhi,SHI Peng fei,DUAN Xiao dong. The Study of Treatment for Organics of Spent Caustic Form Ethene Plant Based on Advanced Oxidation Processes[J]. Journal of Northeast China Institute of Electric Power Engineering, 2003, 23(2): 24-27
Authors:YU Zheng zhe  SUN De zhi  SHI Peng fei  DUAN Xiao dong
Abstract:The performance of UV/H 2O 2 UV/O 3 and UV/H 2O 2/O 3 oxidation systems for treating spent caustic from an ethylene plant was investigated. In UV/H 2O 2 system,with the increase of H 2O 2 dosage, removal efficiencies of COD and the ratio of biochemical oxygen demand(BOD) to chemical oxygen demand(COD) of the effluent were increased and a better performance was obtainced than the H 2O 2 system alone. In UV/H 2O 2system, removal efficiency of COD reach 68% under the optimum condition,and BOD/COD ratio was significantly increased from 0.22 to 0.52. In UV/O 3 system, with the increase of O 3 dosage,removal efficiency of COD and BOD/COD ratio were increased, and a better performance was obtained than the O 3 system alone. Under the optimum condition, removal efficiency of COD was 54%,and BOD/COD ratio was significantly increased from 0.22 to 0.48. In UV/H 2O 2/O 3 system, COD removal efficiency was found to be 22.0% higher than UV/O 3 system.
Keywords:Spent caustic  Photochemical oxidation  UV/O 3 system  UV/H 2O 2 system  UV/H 2O 2/O 3 system
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