| 高纯气体中痕量金属杂质的测定 |
| |
| 引用本文： | 崔仙航,徐学敏,严性天,郎文卉.高纯气体中痕量金属杂质的测定[J].半导体学报,1989,10(12):945-951. |
| |
| 作者姓名： | 崔仙航 徐学敏 严性天 郎文卉 |
| |
| 作者单位： | 中国科学院半导体研究所 北京
(崔仙航，徐学敏，严性天)，中国科学院半导体研究所 北京(郎文卉) |
| |
| 摘 要： | 本工作深入研究了高纯氮、氢、氯化氢、氨、硼烷、硅烷、砷烷及磷烷中钼、钙、铬、铜、铁、钾、锰、钠、铅和锌十种常见金属杂质的测定方法,解决了易燃、易爆及剧毒气体的取样,溶液的吸收条件及基体分离等问题.建立了无火焰原子吸收光谱法测定ng·g~(-1)量级的杂质,方法灵敏,简便,对生产及研制工艺将起积极的指导作用.
|
| 关 键 词： | 高纯气体 痕量金属 杂质 测定 |
Determination of Trace Metallic Impurities in High-Purity Gases |
| |
| Cui Xianhang/Institute of Semiconductors,Academia Sinica,BeijingXu Xuemin/Institute of Semiconductors,Academia Sinica,BeijingYan Xingtian/Institute of Semiconductors,Academia Sinica,BeijingLang Wenhui/Institute of Semiconductors,Academia Sinica,Beijing.Determination of Trace Metallic Impurities in High-Purity Gases[J].Chinese Journal of Semiconductors,1989,10(12):945-951. |
| |
| Authors: | Cui Xianhang/Institute of Semiconductors Academia Sinica BeijingXu Xuemin/Institute of Semiconductors Academia Sinica BeijingYan Xingtian/Institute of Semiconductors Academia Sinica BeijingLang Wenhui/Institute of Semiconductors Academia Sinica Beijing |
| |
| Abstract: | Method for determination of trace metallic impurites in high-purity N_2, H_2, HCl,NH_3,B_2H_6,SiH_4, AsH_3 and pH_3 by flameless atomic absorption spectrometry havebeen established. The method is sensitive and simple, and satisfies the requirementof production. |
| |
| Keywords: | Determinaton of trace metallic impurites High-purity gases Flameless atomic absorption spectrometry |
| 本文献已被 CNKI 维普 等数据库收录！ |
| 点击此处可从《半导体学报》浏览原始摘要信息 |
|
点击此处可从《半导体学报》下载全文 |
|
