Subcritical Crack Growth in Sintered Silicon Nitride Exhibiting a Rising R-Curve期刊界 All Journals 搜尽天下杂志传播学术成果专业期刊搜索期刊信息化学术搜索

Subcritical Crack Growth in Sintered Silicon Nitride Exhibiting a Rising R-Curve

Authors:	Akira Okada Naoto Hirosaki Masahiro Yoshimura

Affiliation:	Central Engineering Laboratories, Nissan Motor Company, 1, Natsushima-cho, Yokosuka, Kanagawa 237, Japan;Research Laboratory of Engineering Materials, Tokyo Institute of Technology, 4259, Nagatsuda, Midori, Yokohama 227, Japan

Abstract:	Subscritical crack growth of sintered silicon nitride was analyzed in terms of the R -curve. Provided that the stress intensity at the crack tip governs the subcritical crack-growth velocity, the K _I– V relationship of sintered silicon nitride exhibiting a rising R -curve is shown to shift to the high- K _I region as the crack advances.

Keywords:	crack growth sintering R-curve crack tip stress