| X荧光光谱在溅射工艺研究中的应用 |
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| 引用本文： | 董彦辉,李光平,郑庆瑜. X荧光光谱在溅射工艺研究中的应用[J]. 现代仪器, 2009, 15(4): 13-14 |
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| 作者姓名： | 董彦辉 李光平 郑庆瑜 |
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| 作者单位： | 中国电子科技集团公司第四十六研究所,天津,300192 |
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| 摘 要： | 本文结合X荧光光谱讨论半导体材料镍欧姆接触电极的溅射工艺,形成的工艺流程短、效率高,方便获得更好的欧姆接触。
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| 关 键 词： | X荧光光谱 镍电极 溅射工艺 |
Application of X-ray fluorescence spectra in the sputtering process research |
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| Dong Yanhui,Li Guangping,Zheng Qingyu. Application of X-ray fluorescence spectra in the sputtering process research[J]. Modern Instruments, 2009, 15(4): 13-14 |
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| Authors: | Dong Yanhui Li Guangping Zheng Qingyu |
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| Abstract: | This article discusses the semiconductor ohmic contact material nickel electrode sputtering process by the use of X fluorescence spectrometry, the process to form a short, high efficiency, easy access to a better ohmic contact. |
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| Keywords: | X-ray fluorescence spectrometry Nickel Sputtering process |
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